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Chemical etching device Product List

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Catalyst Surface Reference Etching Method CARE

Flattening various materials at the atomic scale through pads with catalytic functions.

A unique etching technology that utilizes catalytic action to chemically remove only the protrusions on the processed surface by moving ultra-pure water as the processing fluid over a substrate with pads that have catalytic functions (such as films of Pt or Ni). It flattens the surfaces of various materials, including glass and SiC, at the atomic scale. CARE further achieves a P-V of 0.7 nm and aims to become the ultimate processing method capable of achieving flatness at the level of a single atom in the future.

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Etching machine for difficult-to-cut materials like titanium | Hydrogen energy, medical, aerospace

Supports aviation, medical, and fuel cell applications. Achieves high-precision titanium surface processing using hydrofluoric acid control technology, with a focus on safety and environmental considerations.

The titanium etching system developed and manufactured by TSK Schill GmbH is a horizontal wet processing device designed for the precise and safe machining of titanium materials, which possess high strength and corrosion resistance. By precisely controlling the chemical reaction between hydrofluoric acid and the titanium surface, it achieves the removal of the oxide layer and the formation of microstructures. By strictly managing the etching time, temperature, and acid concentration, it consistently achieves the desired surface finish. It directly contributes to improving coating adhesion, enhancing corrosion resistance, and extending product lifespan.

  • Other processing machines
  • Chemical etching device

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